▎ 摘　　要

The possibility of parallel processing of several features was investigated experimentally for the two methods allowing the crystallographically controlled nanopatterning of graphene: scanning tunneling lithography (STL) and carbothermal etching (CTE). It was found that with multitip systems both methods are suitable for parallel processing. CTE has the advantages that only in the atomic force microscope (AFM) indentation phase is needed the multitip system and it can reveal the location of grain boundaries, so that the nanodevices can be placed in a way that they do not cross grain boundaries. STL is well suited for purposefully producing twisted graphene multilayers with precisely-know misorientations of the individual layers, as also evidenced by Moire-type patterns observed in the atomic resolution scanning tunneling microscopy (STM) images. (C) 2011 Elsevier B.V. All rights reserved.