• 文献标题:   Chemical Stability of Graphene Fluoride Produced by Exposure to XeF2
  • 文献类型:   Article
  • 作  者:   STINE R, LEE WK, WHITENER KE, ROBINSON JT, SHEEHAN PE
  • 作者关键词:   graphene, graphene fluoride, fluorographene, stability, xenon difluoride
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   US Naval Res Lab
  • 被引频次:   79
  • DOI:   10.1021/nl4021039
  • 出版年:   2013

▎ 摘  要

Fluorination can alter the electronic properties of graphene and activate sites for subsequent chemistry. Here, we show that graphene fluorination depends on several variables, including XeF2 exposure and the choice of substrate. After fluorination, fluorine content declines by 50-80% over several days before stabilizing. While highly fluorinated samples remain insulating, mildly fluorinated samples regain some conductivity over this period. Finally, this loss does not reduce reactivity with alkylamines, suggesting that only nonvolatile fluorine participates in these reactions.