▎ 摘　　要

A grid assisted deposition technique for the production of three dimensional graphene oxide (GO) patterns is presented. By combining the advantages of both GO solubility and ordered metallic master grids, microstructured graphene arrays were obtained. The high thermal conductivity of a copper grid, used as master, leads by thermal annealing to the reduction of the GO pattern with a subsequent increase of the electrical conductivity of the GO array. Compared to the two-dimensional planar reduced GO structure, such 3D structures may represent interesting advantages for the realization of functional surfaces with high surface-to-volume ratio and with selective reactive sites over a specific device area. (C) 2015 Elsevier B.V. All rights reserved.