• 文献标题:   Photoresponse in graphene induced by defect engineering
  • 文献类型:   Article
  • 作  者:   DU RX, WANG WH, DU JX, GUO XT, LIU E, BING D, BAI J
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS EXPRESS
  • ISSN:   1882-0778 EI 1882-0786
  • 通讯作者地址:   Southeast Univ
  • 被引频次:   3
  • DOI:   10.7567/APEX.9.115101
  • 出版年:   2016

▎ 摘  要

We present a photoresponse study on a lateral defect/pristine graphene junction device fabricated by a simple plasma irradiation method. The junction between pristine graphene and plasma-modified graphene was created by controlling the location of Ar+ plasma treatment. We found that a distinct photocurrent was generated at the junction by photocurrent line scanning measurements, and further analysis reveals that the photothermoelectric (PTE) effect, instead of the photovoltaic (PV) effect, dominates the photocurrent generation at the interface. Additionally, the obtained results suggest that tuning the defect density could be effective in modulating the optoelectronic performance of junctions in our device. (C) 2016 The Japan Society of Applied Physics