▎ 摘　　要

Graphene nanoribbons are predicted to support low-loss and tunable plasmonic waveguide modes with an ultrasmall mode area. Experimental observation of the plasmonic waveguide modes in graphene nanoribbons, however, is challenging because conventional wet lithography has difficulty creating a clean graphene nanoribbon with a low edge roughness. Here, we use a dry lithography method to fabricate ultraclean and low-roughness graphene nanoribbons, which are then encapsulated in hexagonal boron nitride (hBN). We demonstrate low-loss plasmon propagation with a quality factor up to 35 in the ultraclean nanoribbon waveguide using cryogenic infrared nanoscopy. In addition, we observe both the fundamental and the higher-order plasmonic waveguide modes for the first time. All the plasmon waveguide modes can be tuned through electrostatic gating. The observed tunable plasmon waveguide modes in ultraclean graphene nanoribbons agree well with the finite-difference time-domain (FDTD) simulation results. They are promising for reconfigurable photonic circuits and devices at a subwavelength scale.