• 文献标题:   Crystalline Bilayer Graphene with Preferential Stacking from Ni-Cu Gradient Alloy
  • 文献类型:   Article
  • 作  者:   GAO ZL, ZHANG QC, NAYLOR CH, KIM Y, ABIDI IH, PING JL, DUCOS P, ZAUBERMAN J, ZHAO MQ, RAPPE AM, LUO ZT, REN L, JOHNSON ATC
  • 作者关键词:   bilayer graphene, singlecrystal, nicu gradient alloy, bernal 30 degrees stacking order, high yield synthesi
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Univ Penn
  • 被引频次:   8
  • DOI:   10.1021/acsnano.7b06992
  • 出版年:   2018

▎ 摘  要

We developed a high-yield synthesis of highly crystalline bilayer graphene (BLG) with two preferential stacking modes using a Ni-Cu gradient alloy growth substrate. Previously reported approaches for BLG growth include flat growth substrates of Cu or Ni-Cu uniform alloys and "copperpocket" structures. Use of flat substrates has the advantage of being scalable, but the growth mechanism is either "surface limited" (for Cu) or carbon precipitation (for uniform Ni-Cu), which results in multicrystalline BLG grains. For copper pockets, growth proceeds through a carbon back diffusion mechanism, which leads to the formation of highly crystalline BLG, but scaling of the copper pocket structure is expected to be difficult. Here we demonstrate a Ni-Cu gradient alloy that combines the advantages of these earlier methods: the substrate is flat, so easy to scale, while growth proceeds by a carbon back-diffusion mechanism leading to high-yield growth of BLG with high crystallinity. The BLG layer stacking was almost exclusively Bernal or twisted with an angle 30, consistent with first-principles calculations we conducted. Furthermore, we demonstrated scalable production transistor arrays based crystalline Bernal-stacked BLG with a band gap that was tunable at room temperature.