▎ 摘　　要

Functional graphene oxide (FGO) with photosensitivity was incorporated into the photosensitive polyimide (PSPI) matrix via solution blending, to prepare the photocrosslinkable nano-composite films. The crosslinked composite films were obtained through UV irradiation. FGO was well dispersed in PSPI matrix and effectively covalently bonded to PSPI main chains through photo-chemical reaction. Due to the confine of electronic polarization caused by the crosslinked structure, the dielectric constant (k) and dielectric loss tangent (tan delta) of the crosslinked PSPI/FGO films decreased effectively, which could be tuned by varying both the UV irradiation time and FGO loading. Among all the composite films, the film with 0.5 wt% FGO content exposed under UV light for 900 s had the lowest k (2.58) and tan delta (0.026) values at 10 MHz. These findings suggest that PSPI/FGO composite films are promising application in the field of photoresist with low dielectric constant. (C) 2015 Elsevier B.V. All rights reserved.