• 文献标题:   Stress-free InN nanowires grown on graphene by sublimation method
  • 文献类型:   Article
  • 作  者:   CHEN L, LI YW, XIU XQ, CHEN DD, HUA XM, XIE ZL, CHEN P, LIU B, HAN P, ZHANG R, ZHENG YD
  • 作者关键词:   inn, raman, chemical vapor deposition cvd, graphene, stres
  • 出版物名称:   MATERIALS LETTERS
  • ISSN:   0167-577X EI 1873-4979
  • 通讯作者地址:   Nanjing Univ
  • 被引频次:   1
  • DOI:   10.1016/j.matlet.2017.10.007
  • 出版年:   2018

▎ 摘  要

Stress-free InN nanowires (NWs) have been grown on Au/graphene/GaN/sapphire substrate by atmospheric pressure metal-In sublimation method. The phonon E-2(high) and A(1)(LO) mode in Raman spectra of InN grown on graphene is observed at 490.8 and 585 cm(-1) respectively, which is similar to that of bulk InN. The high resolution TEM (HRTEM) image of InN NWs shows that the interplanar spacing of (0002) and (11 - 20) are 2.85 angstrom and 1.77 angstrom, which is according with the XRD result. All the results confirm that Au-catalyst assists the growth of InN NWs, and the stress is released by the aid of the graphene inter-layer. (C) 2017 Elsevier B.V. All rights reserved.