• 文献标题:   Graphene field effect transistor improvement by graphene-silicon dioxide interface modification
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   PEZOLDT J, HUMMEL C, SCHWIERZ F
  • 作者关键词:  
  • 出版物名称:   PHYSICA ELOWDIMENSIONAL SYSTEMS NANOSTRUCTURES
  • ISSN:   1386-9477 EI 1873-1759
  • 通讯作者地址:   TU Ilmenau
  • 被引频次:   6
  • DOI:   10.1016/j.physe.2011.05.008
  • 出版年:   2012

▎ 摘  要

The dependence of the electrical properties of backgate graphene field effect transistor on the silicon surface preparation techniques prior to graphene exfoliation was studied. The influence of standard wet chemical cleaning, with and without a finishing step in an oxygen plasma are compared to a surface preparation finished by hexamethyldisilazane deposition. The carrier drift mobility of backgate p-channel graphene transistors was determined from the measured transconductance. The backgate graphene field effect transistor fabricated by bonding graphene on silicon dioxide modified with hexamethydisilazane showed an improved carrier drift mobility at low electric fields and higher transconductance. (C) 2011 Elsevier B.V. All rights reserved.