• 文献标题:   Gate voltage and drain current stress instabilities in amorphous In-Ga-Zn-O thin-film transistors with an asymmetric graphene electrode
  • 文献类型:   Article
  • 作  者:   KIM J, MYUNG S, NOH HY, JEONG SM, JEONG J
  • 作者关键词:  
  • 出版物名称:   AIP ADVANCES
  • ISSN:   2158-3226
  • 通讯作者地址:   Chungbuk Natl Univ
  • 被引频次:   2
  • DOI:   10.1063/1.4931084
  • 出版年:   2015

▎ 摘  要

The gate voltage and drain current stress instabilities in amorphous In-Ga-Zn-O thin-film transistors (a-IGZO TFTs) having an asymmetric graphene electrode structure are studied. A large positive shift in the threshold voltage, which is well fitted to a stretched-exponential equation, and an increase in the subthreshold slope are observed when drain current stress is applied. This is due to an increase in temperature caused by power dissipation in the graphene/a-IGZO contact region, in addition to the channel region, which is different from the behavior in a-IGZO TFTs with a conventional transparent electrode. (C) 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.