• 文献标题:   Growth of graphene from SiC{0001} surfaces and its mechanisms
  • 文献类型:   Article
  • 作  者:   NORIMATSU W, KUSUNOKI M
  • 作者关键词:   graphene, growth mechanism, silicon carbide
  • 出版物名称:   SEMICONDUCTOR SCIENCE TECHNOLOGY
  • ISSN:   0268-1242 EI 1361-6641
  • 通讯作者地址:   Nagoya Univ
  • 被引频次:   14
  • DOI:   10.1088/0268-1242/29/6/064009
  • 出版年:   2014

▎ 摘  要

Graphene, a one-atom-layer carbon material, can be grown by thermal decomposition of SiC. On Si-terminated SiC(0001), graphene nucleates at steps and grows layer-by-layer, and as a result a homogeneous monolayer or bilayer can be obtained. We demonstrate this mechanism both experimentally and theoretically. On the C-face (000(1) over bar), multilayer graphene nucleates not only at steps, but also on the terraces. These differences reflect the distinct differences in the reactivity of these faces. Due to its high quality and structural controllability, graphene on SiC{0001} surfaces will be a platform for high-speed graphene device applications.