• 文献标题:   NiO Resistive Random Access Memory Nanocapacitor Array on Graphene
  • 文献类型:   Article
  • 作  者:   SON JY, SHIN YH, KIM H, JANG HM
  • 作者关键词:   resistive switching, nio, nanocapacitor, graphene, anodizing aluminum oxide
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Univ Ulsan
  • 被引频次:   137
  • DOI:   10.1021/nn100234x
  • 出版年:   2010

▎ 摘  要

In this study, a NiO RRAM nanocapacitor array was fabricated on a graphene sheet, which was on a Nb-doped SrTiO3 substrate containing terraces with a regular interval of about 100 nm and an atomically smooth surface. For the formation of the NiO RRAM nanocapacitor (Pt/NiO/graphene capacitor) array, an anodic aluminum oxide (AAO) nanotemplate with a pore diameter of about 30 nm and an interpore distance of about 100 nm was used. NiO and Pt were subsequently deposited on the graphene sheet. The NiO RRAM nanocapacitor had a diameter of about 30 +/- 2 nm and a thickness of about 33 +/- 3 nm. Typical unipolar switching characteristics of the NiO RRAM nanocapacitor array were confirmed. The NiO RRAM nanocapacitor array on graphene exhibited lower SET and RESET voltages than that on a bare surface of Nb-doped SrTiO3.