• 文献标题:   Practical and Fundamental Impact of Epitaxial Graphene on Quantum Metrology
  • 文献类型:   Review
  • 作  者:   JANSSEN TJBM, TZALENCHUK A, LARAAVILA S, KUBATKIN S, FAL KO V
  • 作者关键词:   graphene, quantum hall effect, metrology, si, epitaxial graphene
  • 出版物名称:   MAPANJOURNAL OF METROLOGY SOCIETY OF INDIA
  • ISSN:   0970-3950 EI 0974-9853
  • 通讯作者地址:   Natl Phys Lab
  • 被引频次:   0
  • DOI:   10.1007/s12647-013-0064-y
  • 出版年:   2013

▎ 摘  要

The discovery 8 years ago of the quantum Hall effect (QHE) in graphene sparked an immediate interest in the metrological community. Here was a material which was completely different from commonly used semiconductor systems and which seemed to have some uniques properties which could make it ideally suited for high-precision resistance metrology. However, measuring the QHE in graphene turned out to be not so simple as first thought. In particular the small size of exfoliated graphene samples made precision measurements difficult. This dramatically changed with the development of large-area graphene grown on SiC and in this short review paper we discuss the journey from first observation to the highest-ever precision comparison of the QHE.