• 文献标题:   Growth and Intercalation of Graphene on Silicon Carbide Studied by Low-Energy Electron Microscopy
  • 文献类型:   Article
  • 作  者:   SPECK F, OSTLER M, BESENDORFER S, KRONE J, WANKE M, SEYLLER T
  • 作者关键词:   graphene, silicon carbide, lowenergy electron microscopy, growth, intercalation
  • 出版物名称:   ANNALEN DER PHYSIK
  • ISSN:   0003-3804 EI 1521-3889
  • 通讯作者地址:   Univ Erlangen Nurnberg
  • 被引频次:   3
  • DOI:   10.1002/andp.201700046
  • 出版年:   2017

▎ 摘  要

Based on its electronic, structural, chemical, and mechanical properties, many potential applications have been proposed for graphene. In order to realize these visions, graphene has to be synthesized, grown, or exfoliated with properties that are determined by the targeted application. Growth of so-called epitaxial graphene on silicon carbide by sublimation of silicon in an argon atmosphere is one particular method that could potentially lead to electronic applications. In this contribution we summarize our recent work on different aspects of epitaxial graphene growth and interface manipulation by intercalation, which was performed by a combination of low-energy electron microscopy, low-energy electron diffraction, atomic force microscopy and photoelectron spectroscopy.