• 文献标题:   Multiscale simulations of the early stages of the growth of graphene on copper
  • 文献类型:   Article
  • 作  者:   GAILLARD P, CHANIER T, HENRARD L, MOSKOVKIN P, LUCAS S
  • 作者关键词:   growth, graphene, simulation, ab initio, kinetic monte carlo
  • 出版物名称:   SURFACE SCIENCE
  • ISSN:   0039-6028 EI 1879-2758
  • 通讯作者地址:   Univ Namur
  • 被引频次:   10
  • DOI:   10.1016/j.susc.2015.02.014
  • 出版年:   2015

▎ 摘  要

We have performed multiscale simulations of the growth of graphene on defect-free copper (111) in order to model the nucleation and growth of graphene flakes during chemical vapour deposition and potentially guide future experimental work. Basic activation energies for atomic surface diffusion were determined by ab initio calculations. Larger scale growth was obtained within a kinetic Monte Carlo approach (KMC) with parameters based on the ab initio results. The KMC approach counts the first and second neighbours to determine the probability of surface diffusion. We report qualitative results on the size and shape of the graphene islands as a function of deposition flux. The dominance of graphene zigzag edges for low deposition flux, also observed experimentally, is explained by its larger dynamical stability that the present model fully reproduced. (C) 2015 Elsevier B.V. All rights reserved.