• 文献标题:   Regioselectivity in hexagonal boron nitride co-doped graphene
  • 文献类型:   Article
  • 作  者:   JAYAPRAKASH GK, FLORESMORENO R
  • 作者关键词:  
  • 出版物名称:   NEW JOURNAL OF CHEMISTRY
  • ISSN:   1144-0546 EI 1369-9261
  • 通讯作者地址:   Ctr Univ Ciencias Exactas Ingn
  • 被引频次:   1
  • DOI:   10.1039/c8nj03679a
  • 出版年:   2018

▎ 摘  要

The active electron transfer (ET) sites on the graphene surface can be controlled by hexagonal boron nitride (h-BN) doping. We have used analytical Fukui functions based on density functional theory to locate the active ET sites on the h-BN doped graphene (h-BNG) surface. The h-BN doping can improve the active ET sites on the graphene surface and our results prove that on the h-BNG surface, B and N atoms act as oxidation and reduction centers, respectively. The improved ET regioselectivity on the h-BNG surface is correlated with the electronegativity of the dopants and B-N, C-C and C-B/N bond length variations. Therefore, hexagonal boron nitride doping is helpful to tailor the ET active sites on the graphene surface.