▎ 摘　　要

The unique properties of graphene make it a promising material for interconnects in flexible and transparent electronics. To increase the commercial impact of graphene in those applications, a scalable and economical method for producing graphene patterns is required. The direct synthesis of graphene from an area-selectively passivated catalyst substrate can generate patterned graphene of high quality. We here present a solution-based method for producing patterned passivation layers. Various deposition methods such as ink-jet deposition and microcontact printing were explored, that can satisfy application demands for low cost, high resolution and scalable production of patterned graphene. The demonstrated high quality and nanometer precision of grown graphene establishes the potential of this synthesis approach for future commercial applications of graphene. Finally, the ability to transfer high resolution graphene patterns onto complex three-dimensional surfaces affords the vision of graphene-based interconnects in novel electronics.