• 文献标题:   Dielectric-Screening Reduction-Induced Large Transport Gap in Suspended Sub-10 nm Graphene Nanoribbon Functional Devices
  • 文献类型:   Article
  • 作  者:   SCHMIDT ME, MURUGANATHAN M, KANZAKI T, IWASAKI T, HAMMAM AMM, SUZUKI S, OGAWA S, MIZUTA H
  • 作者关键词:   antiferromagnetic insulating ground state, dielectric screening, graphene nanoribbon, helium ion beam milling, transport gap
  • 出版物名称:   SMALL
  • ISSN:   1613-6810 EI 1613-6829
  • 通讯作者地址:   Japan Adv Inst Sci Technol
  • 被引频次:   3
  • DOI:   10.1002/smll.201903025 EA OCT 2019
  • 出版年:   2019

▎ 摘  要

The predicted quasiparticle energy gap of more than 1 eV in sub-6 nm graphene nanoribbons (GNRs) is elusive, as it is strongly suppressed by the substrate dielectric screening. The number of techniques that can produce suspended high-quality and electrically contacted GNRs is small. The helium ion beam milling technique is capable of achieving sub-5 nm patterning; however, the functional device fabrication and the electrical characteristics are not yet reported. Here, the electrical transport measurement of suspended approximate to 6 nm wide mono- and bilayer GNR functional devices is reported, which are obtained through sub-nanometer resolution helium ion beam milling with controlled total helium ion budget. The transport gap opening of 0.16-0.8 eV is observed at room temperature. The measured transport gap of the different edge orientated GNRs is in good agreement with first-principles simulation results. The enhanced electron-electron interaction and reduced dielectric screening in the suspended quasi-1D GNRs and anti-ferromagnetic coupling between opposite edges in the zigzag GNRs substantiate the observed large transport gap.