• 文献标题:   Intrinsic limits of subthreshold slope in biased bilayer graphene transistor
  • 文献类型:   Article
  • 作  者:   MAJUMDAR K, MURALI KVRM, BHAT N, LIN YM
  • 作者关键词:   electronic structure, electrostatic, energy gap, graphene, multilayer, transistor
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Indian Inst Sci
  • 被引频次:   5
  • DOI:   10.1063/1.3364142
  • 出版年:   2010

▎ 摘  要

In this work, we investigate the intrinsic limits of subthreshold slope in a dual gated bilayer graphene transistor using a coupled self-consistent Poisson-bandstructure solver. We benchmark the solver by matching the bias dependent band gap results obtained from the solver against published experimental data. We show that the intrinsic bias dependence of the electronic structure and the self-consistent electrostatics limit the subthreshold slope obtained in such a transistor well above the Boltzmann limit of 60 mV/decade at room temperature, but much below the results experimentally shown till date, indicating room for technological improvement of bilayer graphene.