• 文献标题:   Plasma Treatment of Thin Film Coated with Graphene Flakes for the Reduction of Sheet Resistance
  • 文献类型:   Article
  • 作  者:   KIM SH, OH JS, KIM KN, SEO JS, JEON MH, YANG KC, YEOM GY
  • 作者关键词:   plasma doping, cl2, sheet resistance, graphene, thin film, flexible substrate
  • 出版物名称:   JOURNAL OF NANOSCIENCE NANOTECHNOLOGY
  • ISSN:   1533-4880 EI 1533-4899
  • 通讯作者地址:   Sungkyunkwan Univ
  • 被引频次:   5
  • DOI:   10.1166/jnn.2013.8191
  • 出版年:   2013

▎ 摘  要

We investigated the effects of plasma treatment on the sheet resistance of thin films spray-coated with graphene flakes on polyethylene terephthalate (PET) substrates. Thin films coated with graphene flakes show high sheet resistance due to defects within graphene edges, domains, and residual oxygen content. Cl-2 plasma treatment led to decreased sheet resistance when treatment time was increased, but when thin films were treated for too long the sheet resistance increased again. Optimum treatment time was related to film thickness. The reduction of sheet resistance may be explained by the donation of holes due to forming pi-type covalent bonds of Cl with carbon atoms on graphene surfaces, or by C-Cl bonding at the sites of graphene defects. However, due to radiation damage caused by plasma treatment, sheet resistance increased with increased treatment time. We found that the sheet resistance of PET film coated with graphene flakes could be decreased by 50% under optimum conditions.