▎ 摘　　要

Graphene films are deposited on copper (Cu) and aluminum (Al) substrates, respectively, by using a microwave plasma chemical vapour deposition technique. Furthermore, these graphene films are characterized by a field emission type scanning electron microscope (FE-SEM), Raman spectra, and field emission (FE) I-V measurements. It is found that the surface morphologies of the films deposited on Cu and Al substrates are different: the field emission property of graphene film deposited on the Cu substrate is better than that on the Al substrate, and the lowest turn-on field of 2.4 V/mu m is obtained for graphene film deposited on the Cu substrate. The macroscopic areas of the graphene samples are all above 400 mm(2).