• 文献标题:   Transport Gap in Dual-Gated Graphene Bilayers Using Oxides as Dielectrics
  • 文献类型:   Article
  • 作  者:   LEE K, FALLAHAZAD B, MIN H, TUTUC E
  • 作者关键词:   bilayer, graphene, transport gap
  • 出版物名称:   IEEE TRANSACTIONS ON ELECTRON DEVICES
  • ISSN:   0018-9383
  • 通讯作者地址:   Univ Texas Austin
  • 被引频次:   10
  • DOI:   10.1109/TED.2012.2228203
  • 出版年:   2013

▎ 摘  要

Graphene bilayers in Bernal stacking exhibit a transverse electric (E) field-dependent band gap, which can be used to increase the channel resistivity and enable higher on/off ratio devices. We provide a systematic investigation of transport characteristics in dual-gated graphene bilayer devices as a function of density and E field and at temperatures from room temperature down to 0.3 K. The sample conductivity shows finite threshold voltages along the electron and hole branches, which increase as the E field increases, similar to a gapped semiconductor. We extract the transport gap as a function of E field and discuss the impact of disorder. In addition, we show that beyond the threshold, the bilayer conductivity shows a highly linear dependence on density, which is largely insensitive to the applied E field and the temperature.