• 文献标题:   Interaction between graphene and the surface of SiO2
  • 文献类型:   Article
  • 作  者:   FAN XF, ZHENG WT, CHIHAIA V, SHEN ZX, KUO JL
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF PHYSICSCONDENSED MATTER
  • ISSN:   0953-8984 EI 1361-648X
  • 通讯作者地址:   Jilin Univ
  • 被引频次:   71
  • DOI:   10.1088/0953-8984/24/30/305004
  • 出版年:   2012

▎ 摘  要

The interaction between graphene and a SiO2 surface has been analyzed with first-principles DFT calculations by constructing the different configurations based on alpha-quartz and cristobalite structures. The fact that single-layer graphene can stay stably on a SiO2 surface is explained based on a general consideration of the configuration structures of the SiO2 surface. It is found that the oxygen defect in a SiO2 surface can shift the Fermi level of graphene down which opens up the mechanism of the hole-doping effect of graphene adsorbed on a SiO2 surface observed in a lot of experiments.