▎ 摘　　要

Vertically stacked two-dimensional van der Waals (vdW) heterostructures with specific interlayer angles exhibit peculiar physical properties. Nowadays, most of the stacked layers are fabricated by mechanical exfoliation followed by precise transfer and alignment with micrometer spatial accuracy. This stringent ingredient of sample preparation limits the productivity of device fabrication and the reproducibility of device performance. Here, we demonstrate the one-pot chemical vapor deposition growth of hexagonal boron nitride (hBN)/graphene bilayers with a high-purity moire phase. The epitaxial intercalation of graphene under a hydrogen-terminated hBN template leads to convergent interlayer angles of less than 0.5 degrees. The near 0 degrees stacking angle shows almost 2 orders of magnitude higher likelihood of occurrence compared with angles larger than 0.5 degrees. The bilayers show a substantial enhancement of carrier mobility compared with monolayer graphene owing to protection from the top hBN layer. Our work proposes a large-scale fabrication method of hBN/graphene bilayers with a high uniformity and controlled interlayer rotation and will promote the production development for high-quality vdW heterostructures.