• 文献标题:   Nanopatterning of monolayer graphene by quantum optical lithography
  • 文献类型:   Article
  • 作  者:   PAVEL E, MARINESCU V, LUNGULESCU M
  • 作者关键词:  
  • 出版物名称:   APPLIED OPTICS
  • ISSN:   1559-128X EI 2155-3165
  • 通讯作者地址:  
  • 被引频次:   2
  • DOI:   10.1364/AO.419831
  • 出版年:   2021

▎ 摘  要

Quantum optical lithography, a diffraction-unlimited method, was applied to pattern monolayer graphene at 10 nm resolution. In our tests with chemical vapor deposition monolayer graphene samples, we have succeeded in producing flat surfaces of a sandwich of monolayer graphene-resist on Si, Si3N4, or glass substrates. Complex patterns have been written on monolayer graphene samples by a nanoablation process. The method could be used to realize monolayer graphene nanodevices. (C) 2021 Optical Society of America