• 文献标题:   Towards epitaxial graphene p-n junctions as electrically programmable quantum resistance standards
  • 文献类型:   Article
  • 作  者:   HU JN, RIGOSI AF, KRUSKOPF M, YANG YF, WU BY, TIAN JF, PANNA AR, LEE HY, PAYAGALA SU, JONES GR, KRAFT ME, JARRETT DG, WATANABE K, TANIGUCHI T, ELMQUIST RE, NEWELL DB
  • 作者关键词:  
  • 出版物名称:   SCIENTIFIC REPORTS
  • ISSN:   2045-2322
  • 通讯作者地址:   NIST
  • 被引频次:   1
  • DOI:   10.1038/s41598-018-33466-z
  • 出版年:   2018

▎ 摘  要

We report the fabrication and measurement of top gated epitaxial graphene p-n junctions where exfoliated hexagonal boron nitride (h-BN) is used as the gate dielectric. The four-terminal longitudinal resistance across a single junction is well quantized at the von Klitzing constant R-K with a relative uncertainty of 10(-7). After the exploration of numerous parameter spaces, we summarize the conditions upon which these devices could function as potential resistance standards. Furthermore, we offer designs of programmable electrical resistance standards over six orders of magnitude by using external gating.