▎ 摘　　要

An electrochemistry-assisted microstructuring process is developed for fabricating well-aligned reduced graphene oxide (rGO)-based micropatterns on arbitrary substrates using a combined method of photolithography, electrochemical reduction and wet etching techniques. The dimension of special-shaped rGO microarrays localized in an insulating GO matrix is effectively adjusted by changing GO reduction time without multi-mask patterning. The increased conductivity of rGO micropatterns by several orders of magnitude is achieved by controlling GO thickness and reduction time. The electrochemical activity of rGO micropatterns as microarray electrodes is confirmed by using ferricyanide in aqueous solution as the redox probe. The present method could be a scalable technology to conventional photolithography for fabricating arbitrary rGO micropatterns in an insulating GO matrix for their potential applications in next generation electronic and electrochemical devices. (C) 2014 Elsevier B.V. All rights reserved.