• 文献标题:   Graphene transparent electrodes grown by rapid chemical vapor deposition with ultrathin indium tin oxide contact layers for GaN light emitting diodes
  • 文献类型:   Article
  • 作  者:   XU K, XU C, DENG J, ZHU YX, GUO WL, MAO MM, ZHENG L, SUN J
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Beijing Univ Technol
  • 被引频次:   9
  • DOI:   10.1063/1.4802798
  • 出版年:   2013

▎ 摘  要

By virtue of the small active volume around Cu catalyst, graphene is synthesized by fast chemical vapor deposition (CVD) in a cold wall vertical system. Despite being highly polycrystalline, it is as conductive and transparent as standard graphene and can be used in light emitting diodes as transparent electrodes. 7-10 nm indium tin oxide (ITO) contact layer is inserted between the graphene and p-GaN to enhance hole injection. Devices with forward voltage and transparency comparable to those using traditional 240 nm ITO are achieved with better ultraviolet performances, hinting the promising future for application-oriented graphene by rapid CVD. (C) 2013 AIP Publishing LLC [http://dx.doi.org/10.1063/1.4802798]