• 文献标题:   Controllable Atomic Scale Patterning of Freestanding Monolayer Graphene at Elevated Temperature
  • 文献类型:   Article
  • 作  者:   XU Q, WU MY, SCHNEIDER GF, HOUBEN L, MALLADI SK, DEKKER C, YUCELEN E, DUNINBORKOWSKI RE, ZANDBERGEN HW
  • 作者关键词:   scanning transmission electron microscopy, graphene, controlled sculpting, nondestructive imaging, nanopatterning, selfrepair
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Delft Univ Technol
  • 被引频次:   65
  • DOI:   10.1021/nn3053582
  • 出版年:   2013

▎ 摘  要

We show that by operating a scanning transmission electron microscope (STEM) with a 0.1 nm 300 kV electron beam, one can sculpt free-standing monolayer graphene with close-to-atomic precision at 600 degrees C. The same electron beam that is used for destructive sculpting can be used to image the sculpted monolayer graphene nondestructively. For imaging, a scanning dwell time is used that is about 1000 times shorter than for the sculpting. This approach allows for Instantaneous switching between sculpting and imaging and thus fine-tuning the shape of the sculpted lattice. Furthermore, the sculpting process can be automated using a script. In this way, free-standing monolayer graphene can be controllably sculpted into patterns that are predefined in position, size, and orientation while maintaining defect-free crystallinity of the adjacent lattice. The sculpting and imaging processes can be fully computer-controlled to fabricate complex assemblies of ribbons or other shapes.