• 文献标题:   Soft lithography of graphene sheets via surface energy modification
  • 文献类型:   Article
  • 作  者:   KIM H, JUNG MW, MYUNG S, JUNG D, LEE SS, KONG KJ, LIM J, LEE JH, PARK CY, AN KS
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF MATERIALS CHEMISTRY C
  • ISSN:   2050-7526 EI 2050-7534
  • 通讯作者地址:   Korea Res Inst Chem Technol
  • 被引频次:   14
  • DOI:   10.1039/c2tc00472k
  • 出版年:   2013

▎ 摘  要

A simple and efficient soft lithographic process for an easily applicable patterning method for large-scale graphene sheets was demonstrated. The surface of an elastomeric stamp was functionalized with polar molecules to enhance the interfacial adhesive force between the stamp and the graphene layer. A specific graphene area was then patterned on the initial substrate and transferred to the target surface by contacting with the stamp.