• 文献标题:   Direct evidence of advantage of Cu(111) for graphene synthesis by using Raman mapping and electron backscatter diffraction
  • 文献类型:   Article
  • 作  者:   ISHIHARA M, KOGA Y, KIM J, TSUGAWA K, HASEGAWA M
  • 作者关键词:   singlelayer graphene, fewlayer graphene, thermal chemical vapor deposition, raman, ebsd
  • 出版物名称:   MATERIALS LETTERS
  • ISSN:   0167-577X
  • 通讯作者地址:   Natl Inst Adv Ind Sci Technol
  • 被引频次:   36
  • DOI:   10.1016/j.matlet.2011.06.047
  • 出版年:   2011

▎ 摘  要

The advantageous crystallographic orientation of Cu surface for graphene synthesis by using thermal chemical vapor deposition (CVD) is examined by Raman mapping and electron backscatter diffraction. It is found that Cu(111) predominates over (110) and (100) for single- (SLG) or few-layer graphene (FLG) growth. To confirm this result we attempt the synthesis of graphene on Cu(111) single crystal film surfaces. We confirmed the formation of high quality and high uniformity SLG or FLG over more than 97% of the substrate surface area of 10 mm x 10 mm by Raman mapping. (C) 2011 Elsevier B.V. All rights reserved.