• 文献标题:   Quasi-Free-Standing Epitaxial Graphene on SiC Obtained by Hydrogen Intercalation
  • 文献类型:   Article
  • 作  者:   RIEDL C, COLETTI C, IWASAKI T, ZAKHAROV AA, STARKE U
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW LETTERS
  • ISSN:   0031-9007
  • 通讯作者地址:   Max Planck Inst Festkorperforsch
  • 被引频次:   644
  • DOI:   10.1103/PhysRevLett.103.246804
  • 出版年:   2009

▎ 摘  要

Quasi-free-standing epitaxial graphene is obtained on SiC(0001) by hydrogen intercalation. The hydrogen moves between the (6 root 3 x 6 root 3) R 30 degrees reconstructed initial carbon layer and the SiC substrate. The topmost Si atoms which for epitaxial graphene are covalently bound to this buffer layer, are now saturated by hydrogen bonds. The buffer layer is turned into a quasi-free-standing graphene monolayer with its typical linear pi bands. Similarly, epitaxial monolayer graphene turns into a decoupled bilayer. The intercalation is stable in air and can be reversed by annealing to around 900 degrees C.