• 文献标题:   Chemical vapor deposition of amorphous graphene on ZnO film
  • 文献类型:   Article
  • 作  者:   LI XA, LIU ZR, WANG BL, YANG JP, MA YW, FENG XM, HUANG W, GU MF
  • 作者关键词:   amorphous graphene, zinc oxide, rf magnetron sputtering, chemical vapor deposition
  • 出版物名称:   SYNTHETIC METALS
  • ISSN:   0379-6779
  • 通讯作者地址:   Nanjing Univ Posts Telecommun
  • 被引频次:   6
  • DOI:   10.1016/j.synthmet.2013.04.020
  • 出版年:   2013

▎ 摘  要

Using ZnO film as catalytic substrate and template, honeycomb-like amorphous graphene film could be prepared from chemical vapor deposition of benzene at 700-800 degrees C. The special structure of the amorphous graphene film is inherited from the ZnO film since the film grown on Si wafer by radio frequency magnetron sputtering is composed of numerous ZnO nanocrystals. The topography of the as-prepared graphene film was well depicted by scanning electron microscopy and atomic force microscopy. The amorphous characteristic is clearly revealed by the combination of Raman spectrum, transmission electron microscopy and selected area electron diffraction. The possible growth process is also discussed. (C) 2013 Elsevier B.V. All rights reserved.