• 文献标题:   Electrostatically Induced Quantum Point Contacts in Bilayer Graphene
  • 文献类型:   Article
  • 作  者:   OVERWEG H, EGGIMANN H, CHEN X, SLIZOVSKIY S, EICH M, PISONI R, LEE Y, RICKHAUS P, WATANABE K, TANIGUCH T, FAL KO V, IHN T, ENSSLIN K
  • 作者关键词:   bilayer graphene, quantum point contact, graphite gate, band gap, electrostatic confinement, displacement field
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   ETH
  • 被引频次:   21
  • DOI:   10.1021/acs.nanolett.7b04666
  • 出版年:   2018

▎ 摘  要

We report the fabrication of electrostatically defined nanostructures in encapsulated bilayer graphene, with leakage resistances below depletion gates as high as R similar to 10 G Omega. This exceeds previously reported values of R = 10-100 k Omega.(1-3) We attribute this improvement to the use of a graphite back gate. We realize two split gate devices which define an electronic channel on the scale of the Fermi-wavelength. A channel gate covering the gap between the split gates varies the charge carrier density in the channel. We observe device-dependent conductance quantization of Delta G = 2e(2)/h and Delta G = 4e(2)/h. In quantizing magnetic fields normal to the sample plane, we recover the four-fold Landau level degeneracy of bilayer graphene. Unexpected mode crossings appear at the crossover between zero magnetic field and the quantum Hall regime.