• 文献标题:   The Role of the Fermi Level Pinning in Gate Tunable Graphene-Semiconductor Junctions
  • 文献类型:   Article
  • 作  者:   CHAVES FA, JIMENEZ D
  • 作者关键词:   barristor, fermi level pinning flp, graphene based device, semiconductor device modeling, tunable schottky barrier
  • 出版物名称:   IEEE TRANSACTIONS ON ELECTRON DEVICES
  • ISSN:   0018-9383 EI 1557-9646
  • 通讯作者地址:   Univ Autonoma Barcelona
  • 被引频次:   2
  • DOI:   10.1109/TED.2016.2606139
  • 出版年:   2016

▎ 摘  要

Graphene-based transistors relying on a conventional structure cannot switch properly because of the absence of an energy gap in graphene. To overcome this limitation, a barristor device was proposed, whose operation is based on the modulation of the graphene-semiconductor (GS) Schottky barrier by means of a top gate, and demonstrating an ON-OFF current ratio up to 105. Such a large number is likely due to the realization of an ultraclean interface with virtually no interface trapped charge. However, it is indeed technologically relevant to know the impact that the interface trapped charges might have on the barristor's electrical properties. We have developed a physics-based model of the gate tunable GS heterostructure where nonidealities, such as Fermi level pinning and a "biasdependent barrier lowering effect"have been considered. Using the model, we have made a comprehensive study of the barristor's expected digital performance.