• 文献标题:   Efros-Shklovskii variable-range hopping in reduced graphene oxide sheets of varying carbon sp(2) fraction
  • 文献类型:   Article
  • 作  者:   JOUNG D, KHONDAKER SI
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW B
  • ISSN:   2469-9950 EI 2469-9969
  • 通讯作者地址:   Univ Cent Florida
  • 被引频次:   91
  • DOI:   10.1103/PhysRevB.86.235423
  • 出版年:   2012

▎ 摘  要

We investigate the low-temperature electron transport properties of chemically reduced graphene oxide (RGO) sheets with different carbon sp(2) fractions of 55% to 80%. We show that in the low-bias (Ohmic) regime, the temperature (T) dependent resistance (R) of all the devices follow Efros-Shklovskii variable range hopping (ES-VRH) R similar to exp[(T-ES/T)(1/2)] with T-ES decreasing from 3.1 x 10(4) to 0.42 x 10(4) K and electron localization length increasing from 0.46 to 3.21 nm with increasing sp(2) fraction. From our data, we predict that for the temperature range used in our study, Mott-VRH may not be observed even at 100% sp(2) fraction samples due to residual topological defects and structural disorders. From the localization length, we calculate a band-gap variation of our RGO from 1.43 to 0.21 eV with increasing sp(2) fraction from 55 to 80%, which agrees remarkably well with theoretical predictions. We also show that, in the high bias non-Ohmic regime at low temperature, the hopping is field driven and the data follow R similar to exp[(E0/E)(1/2)] providing further evidence of ES-VRH. DOI: 10.1103/PhysRevB.86.235423