• 文献标题:   Determination of the thickness distribution of a graphene layer grown on a 2 '' SiC wafer by means of Auger electron spectroscopy depth profiling
  • 文献类型:   Article
  • 作  者:   GURBAN S, PECZ B, MENYHARD M, YAKIMOVA R
  • 作者关键词:   graphene on sic, buffer layer composition, aes depth profiling, graphene thicknes, sublimation epitaxy
  • 出版物名称:   APPLIED SURFACE SCIENCE
  • ISSN:   0169-4332 EI 1873-5584
  • 通讯作者地址:   Hungarian Acad Sci
  • 被引频次:   3
  • DOI:   10.1016/j.apsusc.2014.08.019
  • 出版年:   2014

▎ 摘  要

Auger electron spectroscopy (AES) depth profiling was applied for determination of the thickness of a macroscopic size graphene sheet grown on 2 in. 6H-SiC (0 0 0 1) by sublimation epitaxy. The measured depth profile deviated from the expected exponential form showing the presence of an additional, buffer layer. The measured depth profile was compared to the simulated one which allowed the derivation of the thicknesses of the graphene and buffer layers and the Si concentration of buffer layer. It has been shown that the graphene-like buffer layer contains about 30% unsaturated Si. The depth profiling was carried out in several points (diameter 50 mu m), which permitted the constructing of a thickness distribution characterizing the uniformity of the graphene sheet. (C) 2014 Elsevier B.V. All rights reserved.