• 文献标题:   Segregation growth of epitaxial graphene overlayers on Ni(111)
  • 文献类型:   Article
  • 作  者:   YANG Y, FU Q, WEI W, BAO XH
  • 作者关键词:   low energy electron microscopy, graphene, ni 111, cvd
  • 出版物名称:   SCIENCE BULLETIN
  • ISSN:   2095-9273 EI 2095-9281
  • 通讯作者地址:   Chinese Acad Sci
  • 被引频次:   6
  • DOI:   10.1007/s11434-016-1169-9
  • 出版年:   2016

▎ 摘  要

The orientation control of graphene overlayers on metal surface is an important issue which remains as a challenge in graphene growth on Ni surface. Here we have demonstrated that epitaxial graphene overlayers can be obtained by annealing a nickel carbide covered Ni(111) surface using in situ surface imaging techniques. Epitaxial graphene islands nucleate and grow via segregation of dissolved carbon atoms to the top surface at about 400 A degrees C. This is in contrast to a mixture of epitaxial and non-epitaxial graphene domains grown directly on Ni(111) at 540 A degrees C. The different growth behaviors are related to the nucleation dynamics which is controlled by local carbon densities in the near surface region.