• 文献标题:   Modeling and Simulation of Resistive Random Access Memory With Graphene Electrode
  • 文献类型:   Article
  • 作  者:   XIE H, CHEN WC, ZHANG S, ZHU GD, KHALIQ A, HU J, YIN WY
  • 作者关键词:   finite difference method fdm, graphene electrode ge, graphene oxide, oxygen vacancy, resistive random access memory rram
  • 出版物名称:   IEEE TRANSACTIONS ON ELECTRON DEVICES
  • ISSN:   0018-9383 EI 1557-9646
  • 通讯作者地址:   Zhejiang Univ
  • 被引频次:   1
  • DOI:   10.1109/TED.2020.2965182
  • 出版年:   2020

▎ 摘  要

The resistive random access memory with a graphene electrode (GE) is carefully modeled and simulated by considering its geometrical and physical properties. Since the graphene oxide is generated through the migration of oxygen ions from metal oxide to GE affecting current transport in the memory cell, the model of its electrical conductivity with different oxidation degrees is developed, in which the conductivity is exponentially dependent on the oxidation degree. The simulated I-V characteristics, which agree well with those of the experiment, are obtained by self-consistently solving the current transport, heat conduction, and oxygen vacancy migration equations. Based on the simulation, oxygen vacancy density, temperature distribution, and resistances of high- and low-resistance states are extracted and compared. A low-temperature increase due to low power consumption indicates its great potential for high-density integration.