▎ 摘　　要

A facile strategy for the preparation of few-layer chemically stitched and reduced graphene oxide (FL-CMRG) in water using various linear diaminoalkanes with the general formula H2N(CH2) nNH(2) (n = 4, 6, 8) is proposed, and the resulting FL-CMRG was characterized by means of AFM, TEM, XPS, UV-vis, TGA and XRD. Interlayer spacing between bridged FL-CMRG sheets can reach 1.038 nm when the size of the intercalant to (n = 6) H2N (CH2)(6) NH2. A mechanism for forming the FL-CMRG via removal of epoxide and hydroxyl groups from GO and stitching of the GO sheets by various linear diaminoalkanes in water solution has been proposed.