• 文献标题:   Formation of graphene-capped cobalt silicides
  • 文献类型:   Article
  • 作  者:   GREBENYUK GS, DUNAEVSKY SM, LOBANOVA EY, SMIRNOV DA, PRONIN II
  • 作者关键词:   graphene, intercalation, cobalt silicide, photoelectron spectroscopy, dft calculation, thin film
  • 出版物名称:   APPLIED SURFACE SCIENCE
  • ISSN:   0169-4332 EI 1873-5584
  • 通讯作者地址:   Ioffe Inst
  • 被引频次:   5
  • DOI:   10.1016/j.apsusc.2018.11.198
  • 出版年:   2019

▎ 摘  要

Intercalation synthesis of graphene-capped cobalt silicides has been studied in situ by core-level photoelectron spectroscopy with synchrotron radiation and low-energy electron diffraction. It is found that at 400 degrees C the intercalation of graphene/Ni(1 1 1) with cobalt takes place in a wide range of coverage up to 17 ML Co. Graphene is strongly coupled with the upper layer of Co atoms and stabilizes the fcc structure of the intercalated Co(1 1 1) film. Subsequent intercalation of graphene/Co/Ni(1 1 1) with silicon results in the formation of an ordered Co3Si surface phase of the (root 3 x root 3)R30 degrees structure and then of Co2Si silicide and Co-Si solid solution. Our experimental data and DFT calculations have shown that the coupling between the graphene layer and the surface silicide is rather weak and the properties of quasi-freestanding graphene are preserved.