• 文献标题:   Rearrangement of pi-Electron Network and Switching of Edge-Localized pi State in Reduced Graphene Oxide
  • 文献类型:   Article
  • 作  者:   FUJII S, ENOKI T
  • 作者关键词:   oxidized graphene, defect, electronic state, scanning probe microscopy, density functional theory
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Tokyo Inst Technol
  • 被引频次:   11
  • DOI:   10.1021/nn404937z
  • 出版年:   2013

▎ 摘  要

Introduced defects can modulate the intrinsic electronic structure of graphene, causing a drastic switch in its electronic and magnetic properties, in which defect-induced localized pi states near the Fermi level play an important role. Accordingly, considerable effort has been directed toward detailed characterization of the defect-induced state; however, identification of the chemical nature of the defect-induced state remains a challenge. Here, we demonstrate a method for reliable identification of the localized pi states of oxidized vacancy edges in reduced graphene oxide. Depending on the dynamic changes in the oxygen-binding modes, between carbonyl and ether forms in the vacancy edges, the pi-electron network near the edges can rearrange, leading to drastic on-off switching of the localized pi state. This switching can be manipulated via scanning-probe-induced local mechanical force. This study provides fundamental guidance toward understanding how oxidized defect structures contribute to the unique electronic state of graphene oxide and its potential future applications in electronic devices.