▎ 摘　　要

Here we present results on the deposition of graphene and graphene-related phases by chemical vapour deposition (CVD) method. The source of carbon is thermally decomposed acetone (C2H6CO) in Ar main gas flow at different temperatures depending on the substrate used. The deposition of graphene and/or graphene related phases is carried out on commercially available Cu, Ni, (Cu-0.70 + Ni-0.30), mu-metal (Fe-0.16 + Ni-0.77 + Cu-0.05 + Cr-0.2) and SS304 (Fe-0.60 + Ni-0.09 + Cr-0.19 + Mn-0.02 + Si-0.008) metal foils. The obtained thin films are studied by optical microscopy, Raman and X-ray photoelectron spectroscopies. We determined the optimal temperature and fixed values of the remaining parameters of the CVD process for each substrate.