• 文献标题:   Wafer-scale high-resolution patterning of reduced graphene oxide films for detection of low concentration biomarkers in plasma
  • 文献类型:   Article
  • 作  者:   KIM J, CHAE MS, LEE SM, JEONG D, LEE BC, LEE JH, KIM Y, CHANG ST, HWANG KS
  • 作者关键词:  
  • 出版物名称:   Scientific Reports
  • ISSN:   2045-2322
  • 通讯作者地址:   Korea Inst Sci Technol
  • 被引频次:   11
  • DOI:   10.1038/srep31276
  • 出版年:   2016

▎ 摘  要

Given that reduced graphene oxide (rGO)-based biosensors allow disposable and repeatable biomarker detection at the point of care, we developed a wafer-scale rGO patterning method with mass productivity, uniformity, and high resolution by conventional micro-electro-mechanical systems (MEMS) techniques. Various rGO patterns were demonstrated with dimensions ranging from 5 mu m up to several hundred mu m. Manufacture of these patterns was accomplished through the optimization of dry etching conditions. The axis-homogeneity and uniformity were also measured to verify the uniform patternability in 4-inch wafer with dry etching. Over 66.2% of uniform rGO patterns, which have deviation of resistance within range of +/- 10%, formed the entire wafer. We selected amyloid beta (A beta) peptides in the plasma of APP/PS1 transgenic mice as a study model and measured the peptide level by resistance changes of highly uniform rGO biosensor arrays. A beta is a pathological hallmark of Alzheimer's disease and its plasma concentration is in the pg mL(-1) range. The sensor detected the A beta peptides with ultra-high sensitivity; the LOD was at levels as low as 100 fg mL(-1). Our results provide biological evidences that this wafer-scale high-resolution patterning method can be used in rGO-based electrical diagnostic devices for detection of low-level protein biomarkers in biofluids.