▎ 摘　　要

We report a method of in-situ modification of phenolic resin (PR) on improving thermal stability with graphene/SiO(2)hybrids at an ultralow filler loading. GO/SiO(2)hybrids were prepared by electrostatic adsorption method and chemically reduced to RGO/SiO(2)hybrids by NaBH4. The effect of in-situ modification of PR by GO/SiO(2)and RGO/SiO(2)on thermal stability of PR was studied. The results of SEM, XRD and FTIR showed that the hybrids and in-situ polymerization had a significant effect on improving the thermal property of PR. The TG and DTG analyses demonstrated that the thermal performance of PR in 350-500 degrees C was improved prominently. TheT(5%)andT(10%)of 0.1 wt% (RGO-SiO2)/PR were increased by 165.56 degrees C and 89.23 degrees C compared with the pure PR, reaching 381.77 degrees C and 466.20 degrees C, respectively. Moreover, theR(800 degrees C)of 0.1 wt% (GO-SiO2)/PR and 0.1 wt% (RGO-SiO2)/PR reached 69.86 wt% and 70.20 wt%, which increased by 10.75% and 11.29%, respectively, compared with pure PR. Therefore, the application of graphene/SiO(2)hybrids in the in-situ polymerization modification of PR can significantly improve the thermal stability of PR and broaden its application fields.