• 文献标题:   Strong localization in weakly disordered epitaxial graphene
  • 文献类型:   Article
  • 作  者:   SLAWIG D, GRUSCHWITZ M, TEGENKAMP C
  • 作者关键词:   graphene, atomic hydrogen adsorption, surface transport, metal insulator transition, iofferegel criterion
  • 出版物名称:   SURFACE SCIENCE
  • ISSN:   0039-6028 EI 1879-2758
  • 通讯作者地址:  
  • 被引频次:   2
  • DOI:   10.1016/j.susc.2021.121801 EA FEB 2021
  • 出版年:   2021

▎ 摘  要

We studied the adsorption of atomic hydrogen on monolayer graphene and quasi free monolayer graphene, epitaxially grown on SiC(0001). By means of in-situ surface transport measurements, a metal-insulator transition was found on both n- and p-type doped two dimensional electron systems. The detailed analysis of the temperature dependent resistivity revealed that even ultra-low concentrations (n(H) approximate to 10(12) cm(-2)) of locally chemisorbed H-clusters act as effective scattering centers for the propagating electrons and limit the mean-free path L-0 proportional to 1/root n(H). Despite the weak disorder due to adsorption, strong localization was found. The activation energy for destroying the phase coherence within the system is around 30 meV. Our analysis rules out the formation of a band insulator or even a "bad metal" due to adsorption of hydrogen.