• 文献标题:   Tuning the ballistic electron transport of spatial graphene-metal sandwich electrode on a vacuum-silicon-based device
  • 文献类型:   Article
  • 作  者:   SRISONPHAN S, HONGESOMBUT K
  • 作者关键词:  
  • 出版物名称:   RSC ADVANCES
  • ISSN:   2046-2069
  • 通讯作者地址:   Kasetsart Univ
  • 被引频次:   8
  • DOI:   10.1039/c4ra09503k
  • 出版年:   2015

▎ 摘  要

Future high-speed electronic devices rely on the integration of hot-carrier generation and short transit time. Graphene is an attractive material because of its exceptionally high electron mobility along a 2D honeycomb lattice (in-plane transport). Here, we demonstrate the atomic and electrical interactions of graphene-metal (G-M) and metal-graphene-metal (M-G-M) sandwich electrodes on a vacuum-solid-state- based device (i.e., metal-oxide-Si (MOS) with a void channel) forming G-MOS and M-G-MOS, respectively. The combination of a graphene-metal electrode can produce an extremely high ballistic electron emission (similar to 10(6) A cm(-2) at 1 V bias), traveling along the vertical direction perpendicular (out of plane) to the graphene mesh. The electron emission process is found to be very robust under low-voltage operation, even for emitters at ambient conditions. In addition, the proposed configurations exhibit electrostatic tuning of ballistic electron transport, governed either by space-charge-limited current or field-emission current, having the potential to significantly contribute to various nanoelectronic applications.