• 文献标题:   Effect of hydrogen on chemical vapor deposition growth of graphene on Au substrates
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   TERASAWA T, TAIRA T, YASUDA S, OBATA S, SAIKI K, ASAOKA H
  • 作者关键词:  
  • 出版物名称:   JAPANESE JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-4922 EI 1347-4065
  • 通讯作者地址:   Japan Atom Energy Agcy
  • 被引频次:   0
  • DOI:   10.7567/1347-4065/ab19ae
  • 出版年:   2019

▎ 摘  要

Chemical vapor deposition (CVD) on substrates with low C solubility such as Cu and Au is promising to grow monolayer graphene selectively in a large scale. Hydrogen is often added to control the domain size of graphene on Cu, while Au does not require H-2 since Ar is inert against oxidation. The effect of H-2 should be revealed to improve the quality of graphene on Au. Here we report the effect of H-2 on the CVD growth of graphene on Au substrates using in situ radiation-mode optical microscopy. The in situ observation and ex situ Raman spectroscopy revealed that whether H-2 was supplied or not strongly affected the growth rate, thermal radiation contrast, and compressive strain of graphene on Au. We attributed these features to the surface reconstruction of Au(001) depending on H-2 supply. Our results are essential to achieve the graphene growth with high quality on Au for future applications. (C) 2019 The Japan Society of Applied Physics