• 文献标题:   Origin of Voltage-Dependent High Ideality Factors in Graphene-Silicon Diodes
  • 文献类型:   Article
  • 作  者:   PARK HK, CHOI J
  • 作者关键词:   graphene, graphenesilicon device, ideality factor, interface state, quantum capacitance
  • 出版物名称:   ADVANCED ELECTRONIC MATERIALS
  • ISSN:   2199-160X
  • 通讯作者地址:   Kyung Hee Univ
  • 被引频次:   7
  • DOI:   10.1002/aelm.201700317
  • 出版年:   2018

▎ 摘  要

Undoubtedly graphene-silicon (GS) heterostructure devices will play significant roles as future rectifiers, potential barrier modulators, photodetectors, photovoltaic devices, biochemical sensors, and so on. However, typical GS devices suffer from unusually wide-range voltage-dependent high ideality factors (eta = 1.1-33.5). To overcome this hurdle, the origin of this wide-range voltage-dependent ideality factor should first be identified but this has not yet been fully studied. This study focuses on identifying the origin using impedance spectroscopy in conjunction with current-voltage, Raman, and X-ray photoemission spectroscopy. The impedance spectra are analyzed with an equivalent distributed circuit model that accounts for the voltage-dependent resistance and capacitance of graphene, the graphene-metal contact, the silicon interface states, and the nonequilibrium behavior in GS junction. This study clearly shows that the voltage-dependent resistance and capacitance of interface states, graphene, and graphene-metal contact are responsible for the wide-range voltage-dependent high ideality factors. This study provides a potential method to overcome the drawbacks of GS devices.