• 文献标题:   Enhanced Ionic Sensitivity in Solution-Gated Graphene-Hexagonal Boron Nitride Heterostructure Field-Effect Transistors
  • 文献类型:   Article
  • 作  者:   HASAN N, HOU B, MOORE AL, RADADIA AD
  • 作者关键词:   hexagonal boron nitride hbn, ion sensing, solutiongated graphene ion sensitive fieldeffect transistor isfet
  • 出版物名称:   ADVANCED MATERIALS TECHNOLOGIES
  • ISSN:   2365-709X
  • 通讯作者地址:   Louisiana Tech Univ
  • 被引频次:   7
  • DOI:   10.1002/admt.201800133
  • 出版年:   2018

▎ 摘  要

The charge transport in solution-gated graphene devices is affected by the impurities and disorder of the underlying dielectric interface and its interaction with the solution. Advancement in field-effect ion sensing by fabricating a dielectric isomorph, hexagonal boron nitride between graphene and silicon dioxide of a solution-gated graphene field-effect transistor is being reported. Ionic sensitivity of Dirac voltage as high as -198 mV per decade for K+ and -110 mV per decade for Ca(2+ )is recorded. Increased transconductance due to increased charge carrier mobility is accompanied with larger ionic sensitivity of the transconductance due to larger ionic sensitivity of the charge carrier mobility. These findings define a standard to construct future graphene devices for biosensing and bioelectronics applications.